Magnetron Sputtering of Arsenic Doped Zinc Oxide Thin Films

ORAL

Abstract

Zinc Oxide (ZnO) is a wide band gap semiconductor (3.37 eV) with potential applications in LEDs and military technology. ZnO has native n-type defects, making production of p-type material difficult. In order to form p-type material we have deposited arsenic doped ZnO thin films (\textasciitilde 25 microns) by radio frequency magnetron sputtering of a ZnO target onto sapphire substrates coated with evaporated zinc arsenide (ZnAs). Annealing has been employed to improve sample structure. Thin film growth has been refined through characterization by x-ray diffraction techniques, Seebeck effect measurements, and photoluminescence. We will report on the quality of the thin films produced.

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Authors

  • Micah Shelley

    Brigham Young Univ - Provo

  • John Colton

    Brigham Young University, Brigham Young Univ - Provo

  • J. Ryan Peterson

    Brigham Young Univ - Provo

  • Gary Renlund

    Brigham Young Univ - Provo

  • Colin Roberts

    High Precision Devices, Boulder, CO, Raytheon, Tucson, AZ, Seagate Technology, Minneapolis, MN, Ball Aerospace (retired), Bloomfield, CO, New Mexico State University, Brigham Young University, Colorado State University, Heinrich-Heine-Universitat Dusseldorf, National Security Technologies, Universidad de Buenos Aires, Colorado State Univ, Colorado College, Utah State University, Advisor, Material Physics Group, Utah State University, Box Elder Innovations, LLC, JILA and Department of Physics, CU Boulder, JILA and Department of Mathematics, CU Boulder, Colorado State University, Fort Collins, Colorado 80523, USA, JILA, NIST and the University of Colorado, Boulder, NIST, University of Colorado / NIST, University of Colorado/JILA, Colorado Sch of Mines, Colorado School of Mines, Southwestern Indian Polytechnic Institute, UC-Berkeley, Colorado State University, Fort Collins, CO, Wroclaw University of Science and Technology, Wroclaw, Poland, JILA, University of Colorado and NIST, Harvard University and Harvard-MIT Center for Ultracold Atoms, Univ of Colorado - Boulder, USAFA, Univ of Denver, Boyce Research Initiatives and Educational Foundation, Brilliant Sky Observatory, San Diego Mesa College, Utah Valley University, University of Colorado Boulder, Brigham Young Univ - Provo, Oak Ridge National Laboratory, University of Sherbrooke, NIST Boulder, Universidad Complutense de Madrid, Electrical and Computer Engineering Department, Colorado State University, Fort Collins, Co 80525, Lawrence Livermore National Lab. (United States), Physics Department, Colorado State University, Fort Collins, Co 80525, JILA, Department of Physics, University of Colorado Boulder, Los Alamos National Laboratory, University of Alabama, University of Wyoming, University of Guelph, University of Guelph, Canadian Light source