Silicon Dioxide Thin Film CVD with Dichlorosilane and Carbon Dioxide

ORAL

Abstract

Silicon dioxide (SiO$_{2})$ is useful in microelectronics and micro-fabrication (MEMS). It has traditionally been deposited through low pressure chemical vapor deposition (LPCVD) at high temperatures (about 900 to 1000 $^{\circ}$C).One method is to take dichlorosilane (DCS) and an oxidizer such as nitrous oxide (N$_{2}$O). Carbon dioxide (CO$_{2})$ is isoelectric and should therefore behave similarly to N$_{2}$O in this reaction. We explored the deposition of SiO$_{2}$ using CO$_{2}$ and DCS via LPCVD at pressures from 600 mTorr to 5 Torr. We also followed standard practices in depositing SiO$_{2}$ using nitrous oxide and DCS to be used as a standard for comparison. We used ellipsometry and energy-dispersive x-ray spectroscopy (EDS) to measure the thickness, refractive index, and chemical composition of each sample and found that all of our samples were silicon rich. We also observed that most of the deposited films were hazy. SiO$_{2}$ deposited with CO$_{2}$ at pressures near 600 mTorr appeared to be more attributable to thermal oxidation than deposition and was the least silicon rich and least hazy. Around 5 Torr is when SiO$_{2}$ deposition with CO$_{2}$ was first successful with a refractive index of 1.6, atomic ratio of Si to O of 40:60, and the most hazy.

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Authors

  • Brandon McKeon

    None

  • John Colton

    Brigham Young University Dept. of Physics and Astronomy, Brigham Young University, None, The College of William and Mary/Jefferson Lab, Brigham Young University-Idaho, Blue Ridge Research and Consulting LLC, Air Force Research Laboratory - Wright Patterson Air Force Base, Brigham Young Univ - Provo, Blue Ridge Research and Consulting, University of Utah, SRI International, Utah State University, Utah Valley University, Los Alamos National Laboratory, Professor, Graduate, United States Air Force Academy, Arizona State Univ, SiO2 NanoTech, Entrepix Inc, AFRL, Advisor, Brigham Young University- Provo, University of New Mexico, Univ of Utah, University of Wisconsin -- Madison, New Mexico Tech Physics Dept., Retired, Department of Physics and Astronomy, University of Utah, Department of Physics \& Astronomy, University of Hawai'i, JILA and University of Colorado, Boulder, National Institute of Standards and Technology, Boulder, University of Colorado, Boulder, Lawrence Berkeley National Laboratory, National Institute of Standards and Technology, Space Dynamics Lab, New Mexico Tech, BYU Professor, Brigham Young University -- Provo, Northern Arizona University, University of Colorado Boulder, Colorado State University, University of Utah, Department of Physics, New Mexico State University

  • John Colton

    Brigham Young University Dept. of Physics and Astronomy, Brigham Young University, None, The College of William and Mary/Jefferson Lab, Brigham Young University-Idaho, Blue Ridge Research and Consulting LLC, Air Force Research Laboratory - Wright Patterson Air Force Base, Brigham Young Univ - Provo, Blue Ridge Research and Consulting, University of Utah, SRI International, Utah State University, Utah Valley University, Los Alamos National Laboratory, Professor, Graduate, United States Air Force Academy, Arizona State Univ, SiO2 NanoTech, Entrepix Inc, AFRL, Advisor, Brigham Young University- Provo, University of New Mexico, Univ of Utah, University of Wisconsin -- Madison, New Mexico Tech Physics Dept., Retired, Department of Physics and Astronomy, University of Utah, Department of Physics \& Astronomy, University of Hawai'i, JILA and University of Colorado, Boulder, National Institute of Standards and Technology, Boulder, University of Colorado, Boulder, Lawrence Berkeley National Laboratory, National Institute of Standards and Technology, Space Dynamics Lab, New Mexico Tech, BYU Professor, Brigham Young University -- Provo, Northern Arizona University, University of Colorado Boulder, Colorado State University, University of Utah, Department of Physics, New Mexico State University